A combinatorial investigation of sputtered Ta-Al-C thin films

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A combinatorial investigation of sputtered Ta-Al-C thin films

We describe a combinatorial experiment investigating the Ta–Al–C material system, conducted with the aim of determining why the tantalum-containing Mn + 1AXn phases have so far proved to be not amenable to thin-film synthesis. Samples were deposited onto (0001) Al2O3 wafers at 850 °C and characteriz...

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Bibliographic Details
Main Authors:	Tucker, Mark, Bilek, M., McKenzie, D.
Format:	Journal Article
Published:	Elsevier S.A. 2014
Subjects:	Combinatorial Tantalum MAX phase
Online Access:	http://hdl.handle.net/20.500.11937/18171

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