Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films

Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, re...

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Main Authors:	Kassim, Anuar, Nagalingam, Saravanan, Tan, Wee Tee, Mohd Sharif, Atan, Abdullah, Dzulkefly Kuang, Haron, Md. Jelas, Ho, Soon Min
Format:	Article
Language:	English
Published:	Science and Technology Information Institute 2009
Online Access:	http://psasir.upm.edu.my/id/eprint/14222/ http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf

id	upm-14222
recordtype	eprints
spelling	upm-142222015-09-28T00:42:41Z http://psasir.upm.edu.my/id/eprint/14222/ Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films Kassim, Anuar Nagalingam, Saravanan Tan, Wee Tee Mohd Sharif, Atan Abdullah, Dzulkefly Kuang Haron, Md. Jelas Ho, Soon Min Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, respectively. The optical properties were measured to determine transition type and band gap value. The thin films produced were found to be polycrystalline with orthorhombic structure. X-ray diffraction data showed that the most intense peak at 2θ = 30.2° which belongs to (221) plane. As the deposition period was increased up to 80 min, the film gradually grew thicker as shown by the AFM images. It is observed that the best crystallinity of film is obtained at pH 1.5. Also, AFM images revealed that the grains were distributed evenly over the substrate surface. The bandgap value was found to be 1.9 eV with direct transition. Science and Technology Information Institute 2009-12 Article NonPeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf Kassim, Anuar and Nagalingam, Saravanan and Tan, Wee Tee and Mohd Sharif, Atan and Abdullah, Dzulkefly Kuang and Haron, Md. Jelas and Ho, Soon Min (2009) Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films. Philippine Journal of Science, 138 (2). pp. 161-168. ISSN 0031-7683
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Putra Malaysia
building	UPM Institutional Repository
collection	Online Access
language	English
description	Cu4SnS4 thin films were prepared through chemical bath deposition technique. The effect of deposition period and pH was studied to determine the optimum condition for deposition process. The structure and morphology of thin films were investigated by X-ray diffraction and atomic force microscopy, respectively. The optical properties were measured to determine transition type and band gap value. The thin films produced were found to be polycrystalline with orthorhombic structure. X-ray diffraction data showed that the most intense peak at 2θ = 30.2° which belongs to (221) plane. As the deposition period was increased up to 80 min, the film gradually grew thicker as shown by the AFM images. It is observed that the best crystallinity of film is obtained at pH 1.5. Also, AFM images revealed that the grains were distributed evenly over the substrate surface. The bandgap value was found to be 1.9 eV with direct transition.
format	Article
author	Kassim, Anuar Nagalingam, Saravanan Tan, Wee Tee Mohd Sharif, Atan Abdullah, Dzulkefly Kuang Haron, Md. Jelas Ho, Soon Min
spellingShingle	Kassim, Anuar Nagalingam, Saravanan Tan, Wee Tee Mohd Sharif, Atan Abdullah, Dzulkefly Kuang Haron, Md. Jelas Ho, Soon Min Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
author_facet	Kassim, Anuar Nagalingam, Saravanan Tan, Wee Tee Mohd Sharif, Atan Abdullah, Dzulkefly Kuang Haron, Md. Jelas Ho, Soon Min
author_sort	Kassim, Anuar
title	Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_short	Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_full	Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_fullStr	Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_full_unstemmed	Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films
title_sort	effect of deposition period and ph on chemical bath deposited cu4sns4 thin films
publisher	Science and Technology Information Institute
publishDate	2009
url	http://psasir.upm.edu.my/id/eprint/14222/ http://psasir.upm.edu.my/id/eprint/14222/1/Effect%20of%20deposition%20period%20and%20pH%20on%20chemical%20bath%20deposited%20Cu4SnS4%20thin%20films.pdf
first_indexed	2018-09-07T13:29:50Z
last_indexed	2018-09-07T13:29:50Z
_version_	1610955610396819456

Effect of deposition period and pH on chemical bath deposited Cu4SnS4 thin films

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