The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the nea...
| Main Authors: | , , , , , |
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| Published: |
2018
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| Online Access: | http://dspace.uniten.edu.my/jspui/handle/123456789/7839 |