Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering

In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films we...

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Main Authors: Hasan, M.M., Haseeb, A.S.M.A., Saidur, R., Masjuki, H.H., Hamdi, M.
Format: Article
Published: Journal of Applied Sciences 2009
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spelling um-67912017-10-13T09:27:12Z Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering Hasan, M.M. Haseeb, A.S.M.A. Saidur, R. Masjuki, H.H. Hamdi, M. TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO 2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO 2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO 2 thin films. Journal of Applied Sciences 2009 Article PeerReviewed http://www.scopus.com/inward/record.url?eid=2-s2.0-68949221560&partnerID=40&md5=972d2d11af195245889b59b6d4e41f36 Hasan, M.M.; Haseeb, A.S.M.A.; Saidur, R.; Masjuki, H.H.; Hamdi, M. (2009) Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering. Journal of Applied Sciences <http://eprints.um.edu.my/view/publication/Journal_of_Applied_Sciences.html>, 9 (15). pp. 2815-2821. ISSN 18125654 http://eprints.um.edu.my/6791/
repository_type Digital Repository
institution_category Local University
institution University Malaya
building UM Research Repository
collection Online Access
topic TA Engineering (General). Civil engineering (General)
TJ Mechanical engineering and machinery
spellingShingle TA Engineering (General). Civil engineering (General)
TJ Mechanical engineering and machinery
Hasan, M.M.
Haseeb, A.S.M.A.
Saidur, R.
Masjuki, H.H.
Hamdi, M.
Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
description In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO 2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO 2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO 2 thin films.
format Article
author Hasan, M.M.
Haseeb, A.S.M.A.
Saidur, R.
Masjuki, H.H.
Hamdi, M.
author_facet Hasan, M.M.
Haseeb, A.S.M.A.
Saidur, R.
Masjuki, H.H.
Hamdi, M.
author_sort Hasan, M.M.
title Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
title_short Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
title_full Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
title_fullStr Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
title_full_unstemmed Synthesis and annealing of nanostructured TiO 2 films by radio-frequency magnetron sputtering
title_sort synthesis and annealing of nanostructured tio 2 films by radio-frequency magnetron sputtering
publisher Journal of Applied Sciences
publishDate 2009
url http://www.scopus.com/inward/record.url?eid=2-s2.0-68949221560&partnerID=40&md5=972d2d11af195245889b59b6d4e41f36
http://www.scopus.com/inward/record.url?eid=2-s2.0-68949221560&partnerID=40&md5=972d2d11af195245889b59b6d4e41f36
first_indexed 2018-09-06T05:21:20Z
last_indexed 2018-09-06T05:21:20Z
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