Parameter optimization of sputtered Ti interlayer using Taguchi method
The aim of this study was to optimize the process of coating a thin Ti film using a PVD magnetron sputtering system. The Ti thin film acted as an interlayer sandwiched between a substrate and a hard TiSiN coating. The substrates used were glass and high speed steel (HSS). An optimization of the proc...
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| Format: | Article |
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University of Malaya
2011
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| Online Access: | http://www.myjurnal.my/filebank/published_article/10829/ejum_article_1097.pdf http://www.myjurnal.my/filebank/published_article/10829/ejum_article_1097.pdf |