Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic i...

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Main Authors:	Jeong, Hyeon‐Ho, Mark, Andrew G., Lee, Tung‐Chun, Son, Kwanghyo, Chen, Wenwen, Alarcón‐Correa, Mariana, Kim, Insook, Schütz, Gisela, Fischer, Peer
Format:	Online
Language:	English
Published:	John Wiley and Sons Inc. 2015
Online Access:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/

id	pubmed-5115437
recordtype	oai_dc
spelling	pubmed-51154372016-12-15 Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015) Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Cover Picture A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada. John Wiley and Sons Inc. 2015-07-22 /pmc/articles/PMC5115437/ http://dx.doi.org/10.1002/advs.201570022 Text en © 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution‐NonCommercial (http://creativecommons.org/licenses/by-nc/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes.
repository_type	Open Access Journal
institution_category	Foreign Institution
institution	US National Center for Biotechnology Information
building	NCBI PubMed
collection	Online Access
language	English
format	Online
author	Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer
spellingShingle	Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
author_facet	Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer
author_sort	Jeong, Hyeon‐Ho
title	Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_short	Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_full	Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_fullStr	Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_full_unstemmed	Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
title_sort	nanolithography: selectable nanopattern arrays for nanolithographic imprint and etch‐mask applications (adv. sci. 7/2015)
description	A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada.
publisher	John Wiley and Sons Inc.
publishDate	2015
url	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115437/
_version_	1613733277656416256

Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

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