Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances
We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limit...
| Main Authors: | , , , , , |
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| Format: | Online |
| Language: | English |
| Published: |
Springer US
2016
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| Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974215/ |