Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application

Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application

The mass absorption coefficients of tungsten and tantalum were measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This region includes the M3, M4, and M5 absorption edges. X-ray absorption fine structure was calculated within a real-space multiple scattering formalis...

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Main Authors: Levine, Zachary H., Grantham, Steven, Tarrio, Charles, Paterson, David J., McNulty, Ian, Levin, T. M., Ankudinov, Alexei L., Rehr, John J.
Format: Online
Language:English
Published: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2003
Online Access:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4844524/
id pubmed-4844524
recordtype oai_dc
spelling pubmed-48445242016-07-13 Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application Levine, Zachary H. Grantham, Steven Tarrio, Charles Paterson, David J. McNulty, Ian Levin, T. M. Ankudinov, Alexei L. Rehr, John J. Article The mass absorption coefficients of tungsten and tantalum were measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This region includes the M3, M4, and M5 absorption edges. X-ray absorption fine structure was calculated within a real-space multiple scattering formalism; the predicted structure was observed for tungsten and to a lesser degree tantalum as well. Separately, the effects of dynamic screening were observed as shown by an atomic calculation within the relativistic time-dependent local-density approximation. Dynamic screening effects influence the spectra at the 25 % level and are observed for both tungsten and tantalum. We applied these results to characterize spatially-resolved spectra of a tungsten integrated circuit interconnect obtained using a scanning transmission x-ray microscope. The results indicate tungsten fiducial markers were deposited into silica trenches with a depths of 50 % and 60 % of the markers’ heights. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2003 2003-02-01 /pmc/articles/PMC4844524/ /pubmed/27413590 http://dx.doi.org/10.6028/jres.108.002 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
repository_type Open Access Journal
institution_category Foreign Institution
institution US National Center for Biotechnology Information
building NCBI PubMed
collection Online Access
language English
format Online
author Levine, Zachary H.
Grantham, Steven
Tarrio, Charles
Paterson, David J.
McNulty, Ian
Levin, T. M.
Ankudinov, Alexei L.
Rehr, John J.
spellingShingle Levine, Zachary H.
Grantham, Steven
Tarrio, Charles
Paterson, David J.
McNulty, Ian
Levin, T. M.
Ankudinov, Alexei L.
Rehr, John J.
Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
author_facet Levine, Zachary H.
Grantham, Steven
Tarrio, Charles
Paterson, David J.
McNulty, Ian
Levin, T. M.
Ankudinov, Alexei L.
Rehr, John J.
author_sort Levine, Zachary H.
title Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
title_short Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
title_full Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
title_fullStr Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
title_full_unstemmed Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
title_sort mass absorption coefficient of tungsten and tantalum, 1450 ev to 2350 ev: experiment, theory, and application
description The mass absorption coefficients of tungsten and tantalum were measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This region includes the M3, M4, and M5 absorption edges. X-ray absorption fine structure was calculated within a real-space multiple scattering formalism; the predicted structure was observed for tungsten and to a lesser degree tantalum as well. Separately, the effects of dynamic screening were observed as shown by an atomic calculation within the relativistic time-dependent local-density approximation. Dynamic screening effects influence the spectra at the 25 % level and are observed for both tungsten and tantalum. We applied these results to characterize spatially-resolved spectra of a tungsten integrated circuit interconnect obtained using a scanning transmission x-ray microscope. The results indicate tungsten fiducial markers were deposited into silica trenches with a depths of 50 % and 60 % of the markers’ heights.
publisher [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
publishDate 2003
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4844524/
_version_ 1613570738667651072

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