Site-selective local fluorination of graphene induced by focused ion beam irradiation

The functionalization of graphene remains an important challenge for numerous applications expected by this fascinating material. To keep advantageous properties of graphene after modification or functionalization of its structure, local approaches are a promising road. A novel technique is reported...

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Main Authors:	Li, Hu, Daukiya, Lakshya, Haldar, Soumyajyoti, Lindblad, Andreas, Sanyal, Biplab, Eriksson, Olle, Aubel, Dominique, Hajjar-Garreau, Samar, Simon, Laurent, Leifer, Klaus
Format:	Online
Language:	English
Published:	Nature Publishing Group 2016
Online Access:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4731758/

id	pubmed-4731758
recordtype	oai_dc
spelling	pubmed-47317582016-02-03 Site-selective local fluorination of graphene induced by focused ion beam irradiation Li, Hu Daukiya, Lakshya Haldar, Soumyajyoti Lindblad, Andreas Sanyal, Biplab Eriksson, Olle Aubel, Dominique Hajjar-Garreau, Samar Simon, Laurent Leifer, Klaus Article The functionalization of graphene remains an important challenge for numerous applications expected by this fascinating material. To keep advantageous properties of graphene after modification or functionalization of its structure, local approaches are a promising road. A novel technique is reported here that allows precise site-selective fluorination of graphene. The basic idea of this approach consists in the local radicalization of graphene by focused ion beam (FIB) irradiation and simultaneous introduction of XeF2 gas. A systematic series of experiments were carried out to outline the relation between inserted defect creation and the fluorination process. Based on a subsequent X-ray photoelectron spectroscopy (XPS) analysis, a 6-fold increase of the fluorine concentration on graphene under simultaneous irradiation was observed when compared to fluorination under normal conditions. The fluorine atoms are predominately localized at the defects as indicated from scanning tunneling microscopy (STM). The experimental findings are confirmed by density functional theory which predicts a strong increase of the binding energy of fluorine atoms when bound to the defect sites. The developed technique allows for local fluorination of graphene without using resists and has potential to be a general enabler of site-selective functionalization of graphene using a wide range of gases. Nature Publishing Group 2016-01-29 /pmc/articles/PMC4731758/ /pubmed/26822900 http://dx.doi.org/10.1038/srep19719 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
repository_type	Open Access Journal
institution_category	Foreign Institution
institution	US National Center for Biotechnology Information
building	NCBI PubMed
collection	Online Access
language	English
format	Online
author	Li, Hu Daukiya, Lakshya Haldar, Soumyajyoti Lindblad, Andreas Sanyal, Biplab Eriksson, Olle Aubel, Dominique Hajjar-Garreau, Samar Simon, Laurent Leifer, Klaus
spellingShingle	Li, Hu Daukiya, Lakshya Haldar, Soumyajyoti Lindblad, Andreas Sanyal, Biplab Eriksson, Olle Aubel, Dominique Hajjar-Garreau, Samar Simon, Laurent Leifer, Klaus Site-selective local fluorination of graphene induced by focused ion beam irradiation
author_facet	Li, Hu Daukiya, Lakshya Haldar, Soumyajyoti Lindblad, Andreas Sanyal, Biplab Eriksson, Olle Aubel, Dominique Hajjar-Garreau, Samar Simon, Laurent Leifer, Klaus
author_sort	Li, Hu
title	Site-selective local fluorination of graphene induced by focused ion beam irradiation
title_short	Site-selective local fluorination of graphene induced by focused ion beam irradiation
title_full	Site-selective local fluorination of graphene induced by focused ion beam irradiation
title_fullStr	Site-selective local fluorination of graphene induced by focused ion beam irradiation
title_full_unstemmed	Site-selective local fluorination of graphene induced by focused ion beam irradiation
title_sort	site-selective local fluorination of graphene induced by focused ion beam irradiation
description	The functionalization of graphene remains an important challenge for numerous applications expected by this fascinating material. To keep advantageous properties of graphene after modification or functionalization of its structure, local approaches are a promising road. A novel technique is reported here that allows precise site-selective fluorination of graphene. The basic idea of this approach consists in the local radicalization of graphene by focused ion beam (FIB) irradiation and simultaneous introduction of XeF2 gas. A systematic series of experiments were carried out to outline the relation between inserted defect creation and the fluorination process. Based on a subsequent X-ray photoelectron spectroscopy (XPS) analysis, a 6-fold increase of the fluorine concentration on graphene under simultaneous irradiation was observed when compared to fluorination under normal conditions. The fluorine atoms are predominately localized at the defects as indicated from scanning tunneling microscopy (STM). The experimental findings are confirmed by density functional theory which predicts a strong increase of the binding energy of fluorine atoms when bound to the defect sites. The developed technique allows for local fluorination of graphene without using resists and has potential to be a general enabler of site-selective functionalization of graphene using a wide range of gases.
publisher	Nature Publishing Group
publishDate	2016
url	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4731758/
_version_	1613530177874165760

Site-selective local fluorination of graphene induced by focused ion beam irradiation

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