Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices
Following the rapid development of the electronics industry and technology, it is expected that future electronic devices will operate based on functional units at the level of electrically active molecules or even atoms. One pathway to observe and characterize such fundamental operation is to focus...
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pubmed-45820382015-10-02 Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices Moraru, Daniel Samanta, Arup Tyszka, Krzysztof Anh, Le The Muruganathan, Manoharan Mizuno, Takeshi Jablonski, Ryszard Mizuta, Hiroshi Tabe, Michiharu Nano Review Following the rapid development of the electronics industry and technology, it is expected that future electronic devices will operate based on functional units at the level of electrically active molecules or even atoms. One pathway to observe and characterize such fundamental operation is to focus on identifying isolated or coupled dopants in nanoscale silicon transistors, the building blocks of present electronics. Here, we review some of the recent progress in the research along this direction, with a focus on devices fabricated with simple and CMOS-compatible-processing technology. We present results from a scanning probe method (Kelvin probe force microscopy) which show direct observation of dopant-induced potential modulations. We also discuss tunneling transport behavior based on the analysis of low-temperature I-V characteristics for devices representative for different regimes of doping concentration, i.e., different inter-dopant coupling strengths. This overview outlines the present status of the field, opening also directions toward practical implementation of dopant-atom devices. Springer US 2015-09-24 /pmc/articles/PMC4582038/ /pubmed/26403925 http://dx.doi.org/10.1186/s11671-015-1076-z Text en © Moraru et al. 2015 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
repository_type |
Open Access Journal |
institution_category |
Foreign Institution |
institution |
US National Center for Biotechnology Information |
building |
NCBI PubMed |
collection |
Online Access |
language |
English |
format |
Online |
author |
Moraru, Daniel Samanta, Arup Tyszka, Krzysztof Anh, Le The Muruganathan, Manoharan Mizuno, Takeshi Jablonski, Ryszard Mizuta, Hiroshi Tabe, Michiharu |
spellingShingle |
Moraru, Daniel Samanta, Arup Tyszka, Krzysztof Anh, Le The Muruganathan, Manoharan Mizuno, Takeshi Jablonski, Ryszard Mizuta, Hiroshi Tabe, Michiharu Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
author_facet |
Moraru, Daniel Samanta, Arup Tyszka, Krzysztof Anh, Le The Muruganathan, Manoharan Mizuno, Takeshi Jablonski, Ryszard Mizuta, Hiroshi Tabe, Michiharu |
author_sort |
Moraru, Daniel |
title |
Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
title_short |
Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
title_full |
Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
title_fullStr |
Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
title_full_unstemmed |
Tunneling in Systems of Coupled Dopant-Atoms in Silicon Nano-devices |
title_sort |
tunneling in systems of coupled dopant-atoms in silicon nano-devices |
description |
Following the rapid development of the electronics industry and technology, it is expected that future electronic devices will operate based on functional units at the level of electrically active molecules or even atoms. One pathway to observe and characterize such fundamental operation is to focus on identifying isolated or coupled dopants in nanoscale silicon transistors, the building blocks of present electronics. Here, we review some of the recent progress in the research along this direction, with a focus on devices fabricated with simple and CMOS-compatible-processing technology. We present results from a scanning probe method (Kelvin probe force microscopy) which show direct observation of dopant-induced potential modulations. We also discuss tunneling transport behavior based on the analysis of low-temperature I-V characteristics for devices representative for different regimes of doping concentration, i.e., different inter-dopant coupling strengths. This overview outlines the present status of the field, opening also directions toward practical implementation of dopant-atom devices. |
publisher |
Springer US |
publishDate |
2015 |
url |
https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4582038/ |
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1613479457667940352 |