Direct writing of graphene patterns on insulating substrates under ambient conditions

To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a “synthesis + patterning” strategy, which are time consuming and costly for fabricating high-quality graphen...

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Main Authors:	Xiong, Wei, Zhou, Yun Shen, Hou, Wen Jia, Jiang, Li Jia, Gao, Yang, Fan, Li Sha, Jiang, Lan, Silvain, Jean Francois, Lu, Yong Feng
Format:	Online
Language:	English
Published:	Nature Publishing Group 2014
Online Access:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4013930/

id	pubmed-4013930
recordtype	oai_dc
spelling	pubmed-40139302014-05-13 Direct writing of graphene patterns on insulating substrates under ambient conditions Xiong, Wei Zhou, Yun Shen Hou, Wen Jia Jiang, Li Jia Gao, Yang Fan, Li Sha Jiang, Lan Silvain, Jean Francois Lu, Yong Feng Article To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a “synthesis + patterning” strategy, which are time consuming and costly for fabricating high-quality graphene patterns on desired substrates. We developed a nanofabrication process to deposit high-quality graphene patterns directly on insulating substrates via a solid-phase laser direct writing (LDW) process. Open-air and room-temperature fabrication of graphene patterns on insulating substrates has been achieved via a femtosecond LDW process without graphene transfer and patterning. Various graphene patterns, including texts, spirals, line arrays, and integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were fabricated. The LDW method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced functional devices. Nature Publishing Group 2014-05-08 /pmc/articles/PMC4013930/ /pubmed/24809639 http://dx.doi.org/10.1038/srep04892 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License. The images in this article are included in the article's Creative Commons license, unless indicated otherwise in the image credit; if the image is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the image. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/
repository_type	Open Access Journal
institution_category	Foreign Institution
institution	US National Center for Biotechnology Information
building	NCBI PubMed
collection	Online Access
language	English
format	Online
author	Xiong, Wei Zhou, Yun Shen Hou, Wen Jia Jiang, Li Jia Gao, Yang Fan, Li Sha Jiang, Lan Silvain, Jean Francois Lu, Yong Feng
spellingShingle	Xiong, Wei Zhou, Yun Shen Hou, Wen Jia Jiang, Li Jia Gao, Yang Fan, Li Sha Jiang, Lan Silvain, Jean Francois Lu, Yong Feng Direct writing of graphene patterns on insulating substrates under ambient conditions
author_facet	Xiong, Wei Zhou, Yun Shen Hou, Wen Jia Jiang, Li Jia Gao, Yang Fan, Li Sha Jiang, Lan Silvain, Jean Francois Lu, Yong Feng
author_sort	Xiong, Wei
title	Direct writing of graphene patterns on insulating substrates under ambient conditions
title_short	Direct writing of graphene patterns on insulating substrates under ambient conditions
title_full	Direct writing of graphene patterns on insulating substrates under ambient conditions
title_fullStr	Direct writing of graphene patterns on insulating substrates under ambient conditions
title_full_unstemmed	Direct writing of graphene patterns on insulating substrates under ambient conditions
title_sort	direct writing of graphene patterns on insulating substrates under ambient conditions
description	To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a “synthesis + patterning” strategy, which are time consuming and costly for fabricating high-quality graphene patterns on desired substrates. We developed a nanofabrication process to deposit high-quality graphene patterns directly on insulating substrates via a solid-phase laser direct writing (LDW) process. Open-air and room-temperature fabrication of graphene patterns on insulating substrates has been achieved via a femtosecond LDW process without graphene transfer and patterning. Various graphene patterns, including texts, spirals, line arrays, and integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were fabricated. The LDW method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced functional devices.
publisher	Nature Publishing Group
publishDate	2014
url	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4013930/
_version_	1612086555125481472

Direct writing of graphene patterns on insulating substrates under ambient conditions

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