Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes

Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes

Many energy conversion and storage devices exploit structured ceramics with large interfacial surface areas. Vertically aligned carbon nanotube (VACNT) arrays have emerged as possible scaffolds to support large surface area ceramic layers. However, obtaining conformal and uniform coatings of ceramic...

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Main Authors: Yazdani, Nuri, Chawla, Vipin, Edwards, Eve, Wood, Vanessa, Park, Hyung Gyu, Utke, Ivo
Format: Online
Language:English
Published: Beilstein-Institut 2014
Online Access:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999849/
id pubmed-3999849
recordtype oai_dc
spelling pubmed-39998492014-04-28 Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes Yazdani, Nuri Chawla, Vipin Edwards, Eve Wood, Vanessa Park, Hyung Gyu Utke, Ivo Full Research Paper Many energy conversion and storage devices exploit structured ceramics with large interfacial surface areas. Vertically aligned carbon nanotube (VACNT) arrays have emerged as possible scaffolds to support large surface area ceramic layers. However, obtaining conformal and uniform coatings of ceramics on structures with high aspect ratio morphologies is non-trivial, even with atomic layer deposition (ALD). Here we implement a diffusion model to investigate the effect of the ALD parameters on coating kinetics and use it to develop a guideline for achieving conformal and uniform thickness coatings throughout the depth of ultra-high aspect ratio structures. We validate the model predictions with experimental data from ALD coatings of VACNT arrays. However, the approach can be applied to predict film conformality as a function of depth for any porous topology, including nanopores and nanowire arrays. Beilstein-Institut 2014-03-05 /pmc/articles/PMC3999849/ /pubmed/24778944 http://dx.doi.org/10.3762/bjnano.5.25 Text en Copyright © 2014, Yazdani et al; licensee Beilstein-Institut. http://www.beilstein-journals.org/bjnano This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (http://www.beilstein-journals.org/bjnano)
repository_type Open Access Journal
institution_category Foreign Institution
institution US National Center for Biotechnology Information
building NCBI PubMed
collection Online Access
language English
format Online
author Yazdani, Nuri
Chawla, Vipin
Edwards, Eve
Wood, Vanessa
Park, Hyung Gyu
Utke, Ivo
spellingShingle Yazdani, Nuri
Chawla, Vipin
Edwards, Eve
Wood, Vanessa
Park, Hyung Gyu
Utke, Ivo
Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
author_facet Yazdani, Nuri
Chawla, Vipin
Edwards, Eve
Wood, Vanessa
Park, Hyung Gyu
Utke, Ivo
author_sort Yazdani, Nuri
title Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
title_short Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
title_full Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
title_fullStr Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
title_full_unstemmed Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
title_sort modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
description Many energy conversion and storage devices exploit structured ceramics with large interfacial surface areas. Vertically aligned carbon nanotube (VACNT) arrays have emerged as possible scaffolds to support large surface area ceramic layers. However, obtaining conformal and uniform coatings of ceramics on structures with high aspect ratio morphologies is non-trivial, even with atomic layer deposition (ALD). Here we implement a diffusion model to investigate the effect of the ALD parameters on coating kinetics and use it to develop a guideline for achieving conformal and uniform thickness coatings throughout the depth of ultra-high aspect ratio structures. We validate the model predictions with experimental data from ALD coatings of VACNT arrays. However, the approach can be applied to predict film conformality as a function of depth for any porous topology, including nanopores and nanowire arrays.
publisher Beilstein-Institut
publishDate 2014
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999849/
_version_ 1612082511744073728

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