Optimization of the X-ray incidence angle in photoelectron spectrometers
The interplay between X-ray reflectivity, X-ray absorption and photoelectron attenuation in the photoelectron emission process is analyzed. The optimal X-ray incidence angle to maximize the photoelectron signal is evaluated in a wide VUV to hard X-ray energy range.
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| Format: | Online |
| Language: | English |
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International Union of Crystallography
2013
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| Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943557/ |