Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography
This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si0.4Ge0.6/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift in p...
| Main Authors: | , , , , |
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| Format: | Online |
| Language: | English |
| Published: |
Springer
2013
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| Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3765112/ |