Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications
Pt nanodots have been grown on Al2O3 film via atomic layer deposition (ALD) using (MeCp)Pt(Me)3 and O2 precursors. Influence of the substrate temperature, pulse time of (MeCp)Pt(Me)3, and deposition cycles on ALD Pt has been studied comprehensively by scanning electron microscopy, transmission elect...
Main Authors: | , , , , , , , , |
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Format: | Online |
Language: | English |
Published: |
Springer
2013
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Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3666895/ |