Electrodeposited germanium on silicon substrate using a mixture of germanium tetrachloride and propylene glycol
We report the deposition of germanium (Ge) film on silicon (Si) substrate by a simple and low cost electrochemical deposition using a mixture of germanium tetrachloride (GeCl4) and propylene glycol (C3H8O2). The effects of deposition environment and applied current density on the properties of depos...
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| Format: | Journal |
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Jurnal Teknologi, Universiti Teknologi Malaysia
2015
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| Online Access: | http://www.myjurnal.my/public/article-view.php?id=89740 |