Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique

Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique

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Bibliographic Details
Main Authors: Sharif, Khairul Anuar Mat, Muhamad, Muhamad Rasat, R., Ritikos, S.A., Ritikos, R., Goh, B.T., Mat Sharif, K.A., Muhamad, M.R., Rah, Rahman, Saadah Abdul
Format: Article
Language:English
Published: ELSEVIER 2009
Subjects:
Q Science
Online Access:http://repository.um.edu.my/5481/
http://repository.um.edu.my/5481/1/TSF25978.pdf

Internet

http://repository.um.edu.my/5481/
http://repository.um.edu.my/5481/1/TSF25978.pdf

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