Epitaxial integration and properties of SrRuO3 on silicon

Epitaxial integration and properties of SrRuO3 on silicon

We report the integration of SrRuO3, one of the most widely used oxide electrode materials in functional oxide heterostructures, with silicon using molecular-beam epitaxy and an SrTiO3 buffer layer. The resulting SrRuO3 film has a rocking curve full width at half maxi...

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Bibliographic Details
Main Authors: Zhe Wang, Hari P. Nair, Gabriela C. Correa, Jaewoo Jeong, Kiyoung Lee, Eun Sun Kim, Ariel Seidner H., Chang Seung Lee, Han Jin Lim, David A. Muller, Darrell G. Schlom
Format: Article
Language:English
Published: AIP Publishing LLC 2018-08-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5041940

Internet

http://dx.doi.org/10.1063/1.5041940

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