Handbook of thin film deposition : techniques, processes, and technologies

Bibliographic Details
Main Author: Seshan, Krishna (Author)
Format: Book
Language:English
Published: Waltham, Massachusetts : Elsevier , c2012
Edition:3rd ed
Subjects:

MARC

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008 130529s2012 mau eng
020 |a 1437778739 (hardback : alk. paper) 
020 |a 1437778747 (ebook) 
020 |a 9781437778731 (hardback : alk. paper) 
020 |a 9781437778748 (ebook) 
050 0 0 |a TK7872.T55   |b H36 2012 
090 0 0 |a TK7872.T55   |b H36 2012 
245 0 0 |a Handbook of thin film deposition :   |b techniques, processes, and technologies   |c edited by Krishna Seshan 
250 |a 3rd ed 
260 |a Waltham, Massachusetts :   |b Elsevier ,   |c c2012 
300 |a xviii, 392 p. :   |b ill. ;   |c 24 cm. 
504 |a Includes bibliographical references and index 
505 0 |a 1. A perspective on today's scaling challenges and possible future directions -- 2. Scaling and its implications for the integration and design of thin film and processes -- 3. Scaling-its effects on heat generation and cooling of devices. A "Thermal Moore's" law? -- 4. Sputter processing -- 5. Thin-film strain engineering and pattern effects in dielectrics CVD -- 6. Equipment and manufacturability issues in CVD processes -- 7. CMP method and practice -- 8. Process technology for copper interconnects -- 9. Optical thin films -- 10. Thin films in photovoltaics -- 11. Application of thin films in semiconductor memories 
650 0 |a Thin film devices   |x Design and construction 
650 0 |a Thin films 
700 1 |a Seshan, Krishna ,   |e author 
999 |a 1000159975   |b Book   |c OPEN SHELF (30 DAYS)   |e Gong Badak Campus