rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Advanced Ta-based diffusion barriers for Cu interconnects [
  name:
    name part: Heubner, Renae
    role:
      role term: creator
    role:
      role term: author
  type of resource: text
  origin info:
    place:
      place term: nyu
    place:
      place term: New York
    publisher: Nova Science Publishers
    date issued: c2009
    date issued: 2009
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    form: electronic resource]
    extent: 1 online resource (93 p.) : ill
  note: Renae Heubner
  note: Description based on print version record
  note: Includes bibliographical references (p [73]-86) and index
  subject:
    topic: Electrodiffusion
  subject:
    topic: Integrated circuits
  subject:
    topic: Interconnects (Integrated circuit technology)
  classification: TK7874.53 .H83 2009
  identifier: 1607416751 (electronic bk.)
  identifier: 9781604564518
  identifier: 9781607416753 (electronic bk.)
  identifier: http://www.netlibrary.com/urlapi.asp
  record info:
    record creation date: 110228
    record change date: 20110509093000.0
    record identifier: 0000070924