Metrology, inspection, and process control for microlithography XVII

Bibliographic Details
Main Author: Herr, Daniel J. (Author)
Corporate Authors: The International Society for Optical Engineering, Society of Photo-optical Instrumentation Engineers
Format: Book
Published: Washington : SPIE , c2003
Series:SPIE proceedings series 5038
Subjects:

MARC

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245 1 0 |a Metrology, inspection, and process control for microlithography XVII 
260 2 |a Washington :   |b SPIE ,   |c c2003 
300 |a 2 v.(xxvii, 1248 p.) :   |b ill.(some col.) ;   |c 28 cm. 
440 0 0 |a SPIE proceedings series   |v 5038 
504 |a Includes bibliographical references and author index 
650 0 |a Integrated circuits   |x Inspection   |v Congresses 
650 0 |a Integrated circuits   |x Measurement   |v Congresses 
650 0 |a Microlithography   |x Congresses 
700 1 |a Herr, Daniel J. ,   |e author 
710 1 1 |a The International Society for Optical Engineering 
710 1 2 |a Society of Photo-optical Instrumentation Engineers 
999 |a 1000099379   |b Book   |c Close Access   |e Gong Badak Campus 
999 |a 1000099380   |b Book   |c Close Access   |e Gong Badak Campus