Search Results - Radio Ga Ga

Refine Results
  1. 1

    Electrochemical And Radio Frequency Sputtering Growth Of GaN Nanostructures On Porous Silicon by Shamsuddin, Siti Nur Atikah

    Published 2019
    “…This study focuses on the growth and characterization of gallium nitride (GaN) nanostructures deposited on n-type PSi (100) substrate using electrochemical deposition (ECD) and radio frequency (RF) sputtering techniques. …”
    Get full text
    Get full text
  2. 2
  3. 3
  4. 4

    Characteristics of p-Cu20/n-GaN Heterojunction Prepared via Reactive Radio Frequency Magnetron Sputtering by Ooi, P. K., Ng, S. S., Abdullah, M. J.

    Published 2015
    “…In this work, p-type cuprous oxide (Cu20) thin films were deposited on n-type gallium nitride (GaN) by radio frequency (RF) magnetron sputtering. …”
    Get full text
    Get full text
  5. 5
  6. 6

    PA-MBE GaN-Based Optoelectronics on Silicon Substrates by Chuah , Lee Siang

    Published 2009
    “…Dalam penyelidikan ini, epitaksi alur molekul berbantukan plasma nitrogen frekuensi radio (RF) digunakan untuk menumbuhkan bahan galium nitrid (GaN) di atas substrat Si(111) dengan penggunaan aluminium nitrid (AlN) yang ditumbuhkan pada suhu tinggi sebagai lapisan penimbal. …”
    Get full text
    Get full text
  7. 7
  8. 8
  9. 9

    Red Emission Of Thin Film Electroluminescent Device Based On p-GaN. by L, S Chuah, Hassan, Z, Abu Hassan, H

    Published 2007
    “…High quality GaN layers doped with Mg were grown on Si(111) substrates using high temperature AlN as buffer layer by using radio-frequency molecular beam epitaxy (RF-MBE).…”
    Get full text
    Get full text
  10. 10

    DC And RF Characterization Of n-GaN Schottky Diode For Microwave Application by Munir, Tariq

    Published 2011
    “…Among them the most important and critical factors are the reverse leakage current, series resistance, junction capacitance and thermal stability that limits Schottky diode performance on gallium nitride for Direct Current (DC) and Radio Frequency (RF) characteristics. To overcome these limitations we studied the influence of metal contact, contact area, thermal behavior and edge termination on DC and RF characteristics of n-GaN Schottky diode by simulation and fabrication approach.…”
    Get full text
    Get full text
  11. 11
  12. 12
  13. 13
  14. 14
  15. 15

    A1GaN Thin Films On Silicon Substrates For Photodetector And Transistor Devices by Hussein, Asaad Shakir

    Published 2011
    “…Radio-frequency (RF) nitrogen plasmaassisted molecular beam epitaxy (PA-MBE) technique was used to grow AlxGaxN/GaN/AlN thin films on the Si(111) substrates. …”
    Get full text
    Get full text
  16. 16

    Polycrystalline GaN Layer On M-Plane Sapphire Substrate For Metal-Semiconductor-Metal Photodetector by Kamarulzaman, Azharul Ariff

    Published 2017
    “…This thesis describes work on depositing polycrystalline gallium nitride (GaN) on m-plane sapphire substrate using cost effective physical deposition technique; electron beam (e-beam) evaporator and radio frequency (RF) sputtering, followed by annealing treatment in ammonia (NH3) ambient. …”
    Get full text
    Get full text
  17. 17

    Feasibility study of GaN-based MEMS capacitive microphone using finite element method by Rahmat Zaki Auliya, M. F. Mohd. Razip Wee, Subandi, Ayub, Muhammad Ramdzan Buyong, Burhanuddin Yeop Majlis

    Published 2020
    “…Gallium nitride (GaN) is an excellent choice of semiconductor material due to its optoelectronic, mechanical and wide bandgap properties which are highly demanded by high-power and radio-frequency (RF) electronics but also widely employed for the fabrication of Light Emitting Diode (LED). …”
    Get full text
    Get full text
  18. 18
  19. 19

    Structural and Optical Properties of Ultra-high Pure Hot Water Processed Ga2O3 Thin Film by Subramani, Shanmugan, Devarajan, Mutharasu

    Published 2016
    “…The effect of moisture or environment on thin film properties has more influence on gas sensing properties. Radio Frequency sputtered Ga2O3 thin film was synthesized and processed in ultra-high pure hot water at 95 …”
    Get full text
  20. 20

    Effects Of Post-Deposition Annealing In Oxygen Ambient Of Rf Magnetron Sputtered Ga2O3 Thin Film by Hedei, Puteri Haslinda Megat Abdul, Hassan, Zainuriah, Hock, Jin Quah

    Published 2020
    “…In this work, the gallium oxide (Ga2O3) thin films were deposited on silicon substrate using radio frequency (RF) magnetron sputtering and these Ga2O3 thin films were subjected to post-deposition annealing in oxygen ambient at different temperatures of 400, 600, 800, and 1000℃ for 60 minutes. …”
    Get full text
    Get full text