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    Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

    Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist by Koukharenko, Elena, Jekaterina , Kuleshova, Fowler, Marcel, Kok, Swee Leong, Tudor, Michael J., Beeby, Stephen P., Nandhakumar, Iris, White, Neil

    Published 2010
    “…Jpn. J. Appl. Phys.…”
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