A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon

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A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon

Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the filmâ€™s cryst...

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Bibliographic Details
Main Authors:	Tarjudin, Nurul Aini, Sumpono, Imam, Sakrani, Samsudi
Format:	Book Section
Published:	Faculty of Science, Universiti Teknologi Malaysia 2009
Online Access:	http://eprints.utm.my/9031/

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