A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon
Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s cryst...
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| Format: | Book Section |
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Faculty of Science, Universiti Teknologi Malaysia
2009
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| Online Access: | http://eprints.utm.my/9031/ |
| _version_ | 1848891794898550784 |
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| author | Tarjudin, Nurul Aini Sumpono, Imam Sakrani, Samsudi |
| author_facet | Tarjudin, Nurul Aini Sumpono, Imam Sakrani, Samsudi |
| author_sort | Tarjudin, Nurul Aini |
| building | UTeM Institutional Repository |
| collection | Online Access |
| description | Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s crystallinity. It was observed that higher plasma power density tend to increase the degree of crystallinity, while higher gas flow rates appeared to decrease its curves. It was also observed that microstructural defects were lower for samples with lower crystallinity. |
| first_indexed | 2025-11-15T21:03:38Z |
| format | Book Section |
| id | utm-9031 |
| institution | Universiti Teknologi Malaysia |
| institution_category | Local University |
| last_indexed | 2025-11-15T21:03:38Z |
| publishDate | 2009 |
| publisher | Faculty of Science, Universiti Teknologi Malaysia |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | utm-90312017-09-14T06:37:24Z http://eprints.utm.my/9031/ A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon Tarjudin, Nurul Aini Sumpono, Imam Sakrani, Samsudi Effects of plasma power density and gas density on structural properties of nanocrystalline silicon grown by Plasma Enhanced Chemical Vapor Deposition (PECVD)are discussed in this paper. It has been found that both gas flow rates and plasma power density have an opposite effect on the film’s crystallinity. It was observed that higher plasma power density tend to increase the degree of crystallinity, while higher gas flow rates appeared to decrease its curves. It was also observed that microstructural defects were lower for samples with lower crystallinity. Faculty of Science, Universiti Teknologi Malaysia 2009-05 Book Section PeerReviewed Tarjudin, Nurul Aini and Sumpono, Imam and Sakrani, Samsudi (2009) A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon. In: Proceedings of Second International Conference and Workshops on Basic and Applied Sciences & Regional Annual Fundamental Science Seminar 2009. Faculty of Science, Universiti Teknologi Malaysia. ISBN 978â€983â€9805â€74â€1 |
| spellingShingle | Tarjudin, Nurul Aini Sumpono, Imam Sakrani, Samsudi A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title | A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title_full | A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title_fullStr | A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title_full_unstemmed | A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title_short | A review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| title_sort | review on effect of plasma power density and gas flow rate on structural properties of nanocrystalline silicon |
| url | http://eprints.utm.my/9031/ |