Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)

The paper demonstrate the design and simulation study of 2D vertical double- gate MOSFET (VDGM) with an excellent short channel effect (SCE) characteristics. With the gate length of 50 nm, body doping of 3.5 times 1018 cm-3 and oxide thickness, TOX = 2.5 nm, a good drive current ION of 7 muA/mum and...

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Main Authors: Saad, Ismail, Ismail, Razali
Format: Conference or Workshop Item
Language:English
Published: 2006
Subjects:
Online Access:http://eprints.utm.my/7497/
http://eprints.utm.my/7497/1/Razali_Ismail_2006_Design_and_Simulation_of_50_nm.pdf
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author Saad, Ismail
Ismail, Razali
author_facet Saad, Ismail
Ismail, Razali
author_sort Saad, Ismail
building UTeM Institutional Repository
collection Online Access
description The paper demonstrate the design and simulation study of 2D vertical double- gate MOSFET (VDGM) with an excellent short channel effect (SCE) characteristics. With the gate length of 50 nm, body doping of 3.5 times 1018 cm-3 and oxide thickness, TOX = 2.5 nm, a good drive current ION of 7 muA/mum and a low off-state leakage current IOFF of 2 pA/mum was explicitly shown. Besides that, the subthreshold characteristics also highlighted a reasonably well-controlled SCE with subthreshold swing SubVT = 89 mV/decade and threshold voltage VT = 0.56 V. The analysis of body doping effects for SCE optimization and drive current trade-off was also done for an overall investigation and limit of the VDGM.
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format Conference or Workshop Item
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institution Universiti Teknologi Malaysia
institution_category Local University
language English
last_indexed 2025-11-15T20:58:37Z
publishDate 2006
recordtype eprints
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spelling utm-74972010-06-01T15:52:52Z http://eprints.utm.my/7497/ Design and simulation of 50 nm vertical double-gate MOSFET (VDGM) Saad, Ismail Ismail, Razali TK Electrical engineering. Electronics Nuclear engineering The paper demonstrate the design and simulation study of 2D vertical double- gate MOSFET (VDGM) with an excellent short channel effect (SCE) characteristics. With the gate length of 50 nm, body doping of 3.5 times 1018 cm-3 and oxide thickness, TOX = 2.5 nm, a good drive current ION of 7 muA/mum and a low off-state leakage current IOFF of 2 pA/mum was explicitly shown. Besides that, the subthreshold characteristics also highlighted a reasonably well-controlled SCE with subthreshold swing SubVT = 89 mV/decade and threshold voltage VT = 0.56 V. The analysis of body doping effects for SCE optimization and drive current trade-off was also done for an overall investigation and limit of the VDGM. 2006-12 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/7497/1/Razali_Ismail_2006_Design_and_Simulation_of_50_nm.pdf Saad, Ismail and Ismail, Razali (2006) Design and simulation of 50 nm vertical double-gate MOSFET (VDGM). In: Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference, 29 Oct 2006-1 Dec 2006, Kuala Lumpur, Malaysia. http://dx.doi.org/10.1109/SMELEC.2006.380691
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Saad, Ismail
Ismail, Razali
Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title_full Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title_fullStr Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title_full_unstemmed Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title_short Design and simulation of 50 nm vertical double-gate MOSFET (VDGM)
title_sort design and simulation of 50 nm vertical double-gate mosfet (vdgm)
topic TK Electrical engineering. Electronics Nuclear engineering
url http://eprints.utm.my/7497/
http://eprints.utm.my/7497/
http://eprints.utm.my/7497/1/Razali_Ismail_2006_Design_and_Simulation_of_50_nm.pdf