Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique

In the present study, titanium nitride (TiN) films were deposited on high-speed steel (HSS) by using cathodic arc physical vapour deposition (CAPVD) technique. The main drawback of this technique, however, is the formation of macrodroplets (MDs) during deposition, resulting in films with rougher mor...

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Main Authors: Mubarak, A., Hamzah, E., M. R. M., Toff
Format: Article
Published: Elsevier B V 2008
Subjects:
Online Access:http://eprints.utm.my/6848/
_version_ 1848891360508116992
author Mubarak, A.
Hamzah, E.
M. R. M., Toff
author_facet Mubarak, A.
Hamzah, E.
M. R. M., Toff
author_sort Mubarak, A.
building UTeM Institutional Repository
collection Online Access
description In the present study, titanium nitride (TiN) films were deposited on high-speed steel (HSS) by using cathodic arc physical vapour deposition (CAPVD) technique. The main drawback of this technique, however, is the formation of macrodroplets (MDs) during deposition, resulting in films with rougher morphology. The presence of MDs in CAPVD process is a serious problem during practical tooling applications. The goal of this study was to examine the effect of ion etching with and without titanium (Ti) and chromium (Cr) on the properties of TiN coatings deposited on HSS. Various standard characterization techniques and equipment, such as electron microscopy, atomic force microscopy, hardness testing machine and surface roughness tester, were used to analyze and quantify the following properties and parameters: surface morphology, thickness, adhesion and hardness of the deposited coatings. The coatings deposited with Cr ion etching for 8 and 16 min show half the hardness compared to the samples etched with Ti for similar etching times. Both coating thickness and indentation loads influenced the hardness of the deposited coating. Cr ion etching significantly reduced the surface roughness and hardness compared to Ti ion etching.
first_indexed 2025-11-15T20:56:44Z
format Article
id utm-6848
institution Universiti Teknologi Malaysia
institution_category Local University
last_indexed 2025-11-15T20:56:44Z
publishDate 2008
publisher Elsevier B V
recordtype eprints
repository_type Digital Repository
spelling utm-68482017-10-22T05:58:35Z http://eprints.utm.my/6848/ Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique Mubarak, A. Hamzah, E. M. R. M., Toff TJ Mechanical engineering and machinery In the present study, titanium nitride (TiN) films were deposited on high-speed steel (HSS) by using cathodic arc physical vapour deposition (CAPVD) technique. The main drawback of this technique, however, is the formation of macrodroplets (MDs) during deposition, resulting in films with rougher morphology. The presence of MDs in CAPVD process is a serious problem during practical tooling applications. The goal of this study was to examine the effect of ion etching with and without titanium (Ti) and chromium (Cr) on the properties of TiN coatings deposited on HSS. Various standard characterization techniques and equipment, such as electron microscopy, atomic force microscopy, hardness testing machine and surface roughness tester, were used to analyze and quantify the following properties and parameters: surface morphology, thickness, adhesion and hardness of the deposited coatings. The coatings deposited with Cr ion etching for 8 and 16 min show half the hardness compared to the samples etched with Ti for similar etching times. Both coating thickness and indentation loads influenced the hardness of the deposited coating. Cr ion etching significantly reduced the surface roughness and hardness compared to Ti ion etching. Elsevier B V 2008-02-15 Article PeerReviewed Mubarak, A. and Hamzah, E. and M. R. M., Toff (2008) Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique. Materials Science and Engineering: A, 474 (1-2). pp. 236-242. ISSN 09215093 http://doi.dx.org/10.1016/j.msea.2007.04.030 http://dx.doi.org/10.1016/j.msea.2007.04.030
spellingShingle TJ Mechanical engineering and machinery
Mubarak, A.
Hamzah, E.
M. R. M., Toff
Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title_full Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title_fullStr Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title_full_unstemmed Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title_short Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique
title_sort study of macrodroplet and growth mechanisms with and without ion etchings on the properties of tin coatings deposited on hss using cathodic arc physical vapour deposition technique
topic TJ Mechanical engineering and machinery
url http://eprints.utm.my/6848/
http://eprints.utm.my/6848/
http://eprints.utm.my/6848/