Epitaxial methods of quantum device growth

Epitaxy is an affordable method for growing high quality crystalline in quantum device applications. The fabrication of the quantum devices is an outstanding challenge in nanostructure materials science. During last few years, a lot of attention has been devoted to the growth and characterization fo...

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Main Authors: Muhammad, Rosnita, Othaman, Zulkafli, Sakrani, Samsudi, Wahab, Yussof
Format: Article
Language:English
Published: Faculty of Science 2009
Subjects:
Online Access:http://eprints.utm.my/3829/
http://eprints.utm.my/3829/1/RosnitaMuhammad2009_EpitaxialMethodsofQuantumDeviceGrowth.pdf
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author Muhammad, Rosnita
Othaman, Zulkafli
Sakrani, Samsudi
Wahab, Yussof
author_facet Muhammad, Rosnita
Othaman, Zulkafli
Sakrani, Samsudi
Wahab, Yussof
author_sort Muhammad, Rosnita
building UTeM Institutional Repository
collection Online Access
description Epitaxy is an affordable method for growing high quality crystalline in quantum device applications. The fabrication of the quantum devices is an outstanding challenge in nanostructure materials science. During last few years, a lot of attention has been devoted to the growth and characterization for low dimensional semiconductor materials. In this paper, we present several epitaxy methods in recent advancement. We then briefly examine the one and only epitaxial method that we have at Ibnu Sina Institute, Universiti Teknologi Malaysia i.e MOCVD system; starting with basic chemical reaction process, gas delivery equipment, reaction chambers and safety. Growth mechanisms and criteria for growth rate are also will be discussed. Lastly, we show gallium arsenide nanowires that succesfully grown using MOCVD system
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publishDate 2009
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spelling utm-38292017-02-22T04:02:14Z http://eprints.utm.my/3829/ Epitaxial methods of quantum device growth Muhammad, Rosnita Othaman, Zulkafli Sakrani, Samsudi Wahab, Yussof QC Physics Epitaxy is an affordable method for growing high quality crystalline in quantum device applications. The fabrication of the quantum devices is an outstanding challenge in nanostructure materials science. During last few years, a lot of attention has been devoted to the growth and characterization for low dimensional semiconductor materials. In this paper, we present several epitaxy methods in recent advancement. We then briefly examine the one and only epitaxial method that we have at Ibnu Sina Institute, Universiti Teknologi Malaysia i.e MOCVD system; starting with basic chemical reaction process, gas delivery equipment, reaction chambers and safety. Growth mechanisms and criteria for growth rate are also will be discussed. Lastly, we show gallium arsenide nanowires that succesfully grown using MOCVD system Faculty of Science 2009 Article PeerReviewed application/pdf en http://eprints.utm.my/3829/1/RosnitaMuhammad2009_EpitaxialMethodsofQuantumDeviceGrowth.pdf Muhammad, Rosnita and Othaman, Zulkafli and Sakrani, Samsudi and Wahab, Yussof (2009) Epitaxial methods of quantum device growth. Jurnal Fizik UTM, 4 . pp. 1-9. ISSN 0128-8644
spellingShingle QC Physics
Muhammad, Rosnita
Othaman, Zulkafli
Sakrani, Samsudi
Wahab, Yussof
Epitaxial methods of quantum device growth
title Epitaxial methods of quantum device growth
title_full Epitaxial methods of quantum device growth
title_fullStr Epitaxial methods of quantum device growth
title_full_unstemmed Epitaxial methods of quantum device growth
title_short Epitaxial methods of quantum device growth
title_sort epitaxial methods of quantum device growth
topic QC Physics
url http://eprints.utm.my/3829/
http://eprints.utm.my/3829/1/RosnitaMuhammad2009_EpitaxialMethodsofQuantumDeviceGrowth.pdf