Growth of TiO2 thin films by Atomic Layer Deposition (ALD)

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Growth of TiO2 thin films by Atomic Layer Deposition (ALD)

Ceramic oxide thin films are an important material, with applications in many areas of science and technology. Titanium oxide (TiO2) is also a well-known and important material for applications such as gas sensors [1], photocatalysis materials [3], and electrochemicals [1], due to its self-cleaning...

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Bibliographic Details
Main Authors:	Hussin, Rosniza, Kwang, Leong Choy, Xiang, Hui Hou
Format:	Article
Language:	English
Published:	Trans Tech Publications 2016
Subjects:	T Technology (General) TK7800-8360 Electronics
Online Access:	http://eprints.uthm.edu.my/5621/ http://eprints.uthm.edu.my/5621/1/AJ%202016%20%28103%29.pdf

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