Study and analysis of surface charge collection and emission spectrum of plasma ashing process

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Study and analysis of surface charge collection and emission spectrum of plasma ashing process

This research presents an important observation on the total surface charge collection using quantox wafers through the measurement of surface voltage (Vs) on wafer surface with contactless Kelvin Probe for changes in parameters during plasma ashing. In this report, it is covered on the plasma chara...

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Bibliographic Details
Main Author:	Sivapathy, Kanthaan
Format:	Thesis
Language:	English English English
Published:	2019
Subjects:	QD450-801 Physical and theoretical chemistry
Online Access:	http://eprints.uthm.edu.my/533/ http://eprints.uthm.edu.my/533/1/24p%20KANTHAAN%20SIVAPATHY.pdf http://eprints.uthm.edu.my/533/2/KANTHAAN%20SIVAPATHY%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/533/3/KANTHAAN%20SIVAPATHY%20WATERMARK.pdf

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