The effect of substrate on TiO2 thin films deposited by atomic layer
deposition (ALD)

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The effect of substrate on TiO2 thin films deposited by atomic layer deposition (ALD)

"ALD is a precision growth technique that can deposit either amorphous or polycrystalline thin films on a variety of substrates. The difference in substrate can cause a variation in the ALD process, even it is carried out using the same reactants and deposition conditions [1]. TiO2 thin films...

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Bibliographic Details
Main Authors:	Hussin, Rosniza, Kwang, Leong Choy, Xianghui, Hou
Format:	Article
Language:	English
Published:	Trans Tech Publications, Switzerland 2015
Subjects:	T Technology (General) TA401-492 Materials of engineering and construction. Mechanics of materials
Online Access:	http://eprints.uthm.edu.my/4878/ http://eprints.uthm.edu.my/4878/1/AJ%202015%20%2844%29.pdf

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