Fabrication of Cu2O based homostructure thin film using electrodeposition method

Copper oxide (Cu2O) is one of inorganic materials used in photovoltaic (PV) technology. It was reported that Cu2O that acts as the p-n junction semiconductor material was preferable in extensive studies for solar cell application. However, the heterojunction interface between p-type Cu2O to other ma...

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Main Author: Mohamad Arifin, Nurliyana
Format: Thesis
Language:English
English
English
Published: 2018
Subjects:
Online Access:http://eprints.uthm.edu.my/444/
http://eprints.uthm.edu.my/444/1/24p%20NURLIYANA%20MOHAMAD%20ARIFIN.pdf
http://eprints.uthm.edu.my/444/2/NURLIYANA%20MOHAMAD%20ARIFIN%20COPYRIGHT%20DECLARATION.pdf
http://eprints.uthm.edu.my/444/3/NURLIYANA%20MOHAMAD%20ARIFIN%20WATERMARK.pdf
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author Mohamad Arifin, Nurliyana
author_facet Mohamad Arifin, Nurliyana
author_sort Mohamad Arifin, Nurliyana
building UTHM Institutional Repository
collection Online Access
description Copper oxide (Cu2O) is one of inorganic materials used in photovoltaic (PV) technology. It was reported that Cu2O that acts as the p-n junction semiconductor material was preferable in extensive studies for solar cell application. However, the heterojunction interface between p-type Cu2O to other materials has lower conversion efficiency due to lattice mismatch. Thus, a p-n Cu2O homojunction thin film had been introduced to acquire higher efficiency due to similar interface which can promote less defects between layers. In this experiment, both n and p-type Cu2O thin film was fabricated by using copper acetate based solution through electrodeposition method . Firstly, the effects of pH value and deposition time were optimized for fabrication of n-type Cu2O thin film on fluorine doped thin oxide (FTO) glass. The deposition potential optimization was conducted using Cyclic Voltammetry Measurement. Then, the effects of bath temperature and deposition time were optimized for p-type Cu2O on n-type Cu2O/FTO substrate to obtain p-type based homostructure. Structural, morphological, topological and optical properties were characterized by using Cyclic Voltammetry, X-ray diffraction (XRD), Field Emission-Scanning Electron Microscope (FE-SEM), Atomic Force Microscopy (AFM) and Ultraviolet-Vis ib le Absorption Spectroscopy (UV-Vis), respectively. The conduction type for n-type and p-type Cu2O thin film also have been characterized by using Photoelectrochemica l Measurement (PEC). The optimum parameters obtained for n-type Cu2O were pH of 6.3, deposition time of 30 minutes, bath temperature of 60 ℃ and deposition potential of -0.125V vs Ag/AgCl. Meanwhile, the optimum parameters for fabrication of p-type Cu2O on n-type Cu2O/FTO susbstrate were pH of 12.5, deposition time of 2 hours, bath temperature of 40 ℃ and potential deposition of -0.4 V vs Ag/AgCl. The p-type Cu2O based homostructure thin film was successfully fabricated and can be implemented in fabrication of Cu2O homojunction thin film in photovoltaic for solar cell.
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institution Universiti Tun Hussein Onn Malaysia
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language English
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publishDate 2018
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spelling uthm-4442021-07-25T06:28:38Z http://eprints.uthm.edu.my/444/ Fabrication of Cu2O based homostructure thin film using electrodeposition method Mohamad Arifin, Nurliyana TA401-492 Materials of engineering and construction. Mechanics of materials Copper oxide (Cu2O) is one of inorganic materials used in photovoltaic (PV) technology. It was reported that Cu2O that acts as the p-n junction semiconductor material was preferable in extensive studies for solar cell application. However, the heterojunction interface between p-type Cu2O to other materials has lower conversion efficiency due to lattice mismatch. Thus, a p-n Cu2O homojunction thin film had been introduced to acquire higher efficiency due to similar interface which can promote less defects between layers. In this experiment, both n and p-type Cu2O thin film was fabricated by using copper acetate based solution through electrodeposition method . Firstly, the effects of pH value and deposition time were optimized for fabrication of n-type Cu2O thin film on fluorine doped thin oxide (FTO) glass. The deposition potential optimization was conducted using Cyclic Voltammetry Measurement. Then, the effects of bath temperature and deposition time were optimized for p-type Cu2O on n-type Cu2O/FTO substrate to obtain p-type based homostructure. Structural, morphological, topological and optical properties were characterized by using Cyclic Voltammetry, X-ray diffraction (XRD), Field Emission-Scanning Electron Microscope (FE-SEM), Atomic Force Microscopy (AFM) and Ultraviolet-Vis ib le Absorption Spectroscopy (UV-Vis), respectively. The conduction type for n-type and p-type Cu2O thin film also have been characterized by using Photoelectrochemica l Measurement (PEC). The optimum parameters obtained for n-type Cu2O were pH of 6.3, deposition time of 30 minutes, bath temperature of 60 ℃ and deposition potential of -0.125V vs Ag/AgCl. Meanwhile, the optimum parameters for fabrication of p-type Cu2O on n-type Cu2O/FTO susbstrate were pH of 12.5, deposition time of 2 hours, bath temperature of 40 ℃ and potential deposition of -0.4 V vs Ag/AgCl. The p-type Cu2O based homostructure thin film was successfully fabricated and can be implemented in fabrication of Cu2O homojunction thin film in photovoltaic for solar cell. 2018-03 Thesis NonPeerReviewed text en http://eprints.uthm.edu.my/444/1/24p%20NURLIYANA%20MOHAMAD%20ARIFIN.pdf text en http://eprints.uthm.edu.my/444/2/NURLIYANA%20MOHAMAD%20ARIFIN%20COPYRIGHT%20DECLARATION.pdf text en http://eprints.uthm.edu.my/444/3/NURLIYANA%20MOHAMAD%20ARIFIN%20WATERMARK.pdf Mohamad Arifin, Nurliyana (2018) Fabrication of Cu2O based homostructure thin film using electrodeposition method. Masters thesis, Universiti Tun Hussein Onn Malaysia.
spellingShingle TA401-492 Materials of engineering and construction. Mechanics of materials
Mohamad Arifin, Nurliyana
Fabrication of Cu2O based homostructure thin film using electrodeposition method
title Fabrication of Cu2O based homostructure thin film using electrodeposition method
title_full Fabrication of Cu2O based homostructure thin film using electrodeposition method
title_fullStr Fabrication of Cu2O based homostructure thin film using electrodeposition method
title_full_unstemmed Fabrication of Cu2O based homostructure thin film using electrodeposition method
title_short Fabrication of Cu2O based homostructure thin film using electrodeposition method
title_sort fabrication of cu2o based homostructure thin film using electrodeposition method
topic TA401-492 Materials of engineering and construction. Mechanics of materials
url http://eprints.uthm.edu.my/444/
http://eprints.uthm.edu.my/444/1/24p%20NURLIYANA%20MOHAMAD%20ARIFIN.pdf
http://eprints.uthm.edu.my/444/2/NURLIYANA%20MOHAMAD%20ARIFIN%20COPYRIGHT%20DECLARATION.pdf
http://eprints.uthm.edu.my/444/3/NURLIYANA%20MOHAMAD%20ARIFIN%20WATERMARK.pdf