Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

Nano-crystalline TiO2 has been prepared by RF magnetron sputtering at varied substrate temperatures ranging from 200 to 500 °C. The alteration of oxygen and titanium atom in TiO2 at uppermost surface is clearly observed on the effect of annealing temperature by Auger Electron Spectroscopy (AES) tech...

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Bibliographic Details
Main Authors: Abdullah, S.A., Sahdan, M.Z., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C.H., Adriyanto, F.
Format: Article
Language:English
Published: ScienceDirect 2018
Subjects:
TA401-492 Materials of engineering and construction. Mechanics of materials
Online Access:http://eprints.uthm.edu.my/3360/
http://eprints.uthm.edu.my/3360/1/AJ%202018%20%284%29.pdf

Internet

http://eprints.uthm.edu.my/3360/
http://eprints.uthm.edu.my/3360/1/AJ%202018%20%284%29.pdf

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