APA (7th ed.) Citation

Abdullah, S., Sahdan, M., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C., & Adriyanto, F. (2018). Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering. ScienceDirect.

Chicago Style (17th ed.) Citation

Abdullah, S.A, M.Z Sahdan, N. Nafarizal, H. Saim, Z. Embong, C.H Cik Rohaida, and F. Adriyanto. Influence of Substrate Annealing on Inducing Ti3+ and Oxygen Vacancy in TiO2 Thin Films Deposited via RF Magnetron Sputtering. ScienceDirect, 2018.

MLA (9th ed.) Citation

Abdullah, S.A, et al. Influence of Substrate Annealing on Inducing Ti3+ and Oxygen Vacancy in TiO2 Thin Films Deposited via RF Magnetron Sputtering. ScienceDirect, 2018.