Fabrication of smart glass electrochromic device using rf magnetron sputtering
Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest...
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| Format: | Thesis |
| Language: | English English English |
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2014
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| Online Access: | http://eprints.uthm.edu.my/1722/ http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf |
| _version_ | 1848887542037872640 |
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| author | Abdullah, Siti Ashraf |
| author_facet | Abdullah, Siti Ashraf |
| author_sort | Abdullah, Siti Ashraf |
| building | UTHM Institutional Repository |
| collection | Online Access |
| description | Electrochromic device is an important functional device to control the amount of light
through a glass. It usually used in sunlight control window glazing for buildings and
automobile. The important feature of electrochromic glass is the ability to response
toward the apply voltage in shortest time, and endurance to maintain in color shape after
apply voltage. In this thesis, the oxygen gas percentage is optimized during the
fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing
application by using RF magnetron sputtering. The oxygen flow rate for the deposition
is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The
structures of WO3 were investigated using X-Ray diffraction, Field effect scanning
electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The
electrochromic properties were characterized by a cyclic voltammogram and UV-Vis
absorption spectra. The results show that nanocrystalline film with particle size of
51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and
coloration efficiency among the others. The time respond taken for complete coloration
at 4V is 2second. This result is a starting point for future work such as optimizing the
film thickness or doping by other metals. |
| first_indexed | 2025-11-15T19:56:02Z |
| format | Thesis |
| id | uthm-1722 |
| institution | Universiti Tun Hussein Onn Malaysia |
| institution_category | Local University |
| language | English English English |
| last_indexed | 2025-11-15T19:56:02Z |
| publishDate | 2014 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | uthm-17222021-10-04T08:47:45Z http://eprints.uthm.edu.my/1722/ Fabrication of smart glass electrochromic device using rf magnetron sputtering Abdullah, Siti Ashraf TA Engineering (General). Civil engineering (General) TA1501-1820 Applied optics. Photonics Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals. 2014-01 Thesis NonPeerReviewed text en http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf text en http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf text en http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf Abdullah, Siti Ashraf (2014) Fabrication of smart glass electrochromic device using rf magnetron sputtering. Masters thesis, Universiti Tun Hussein Onn Malaysia. |
| spellingShingle | TA Engineering (General). Civil engineering (General) TA1501-1820 Applied optics. Photonics Abdullah, Siti Ashraf Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title | Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title_full | Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title_fullStr | Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title_full_unstemmed | Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title_short | Fabrication of smart glass electrochromic device using rf magnetron sputtering |
| title_sort | fabrication of smart glass electrochromic device using rf magnetron sputtering |
| topic | TA Engineering (General). Civil engineering (General) TA1501-1820 Applied optics. Photonics |
| url | http://eprints.uthm.edu.my/1722/ http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf |