TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-depo...
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| Format: | Conference or Workshop Item |
| Language: | English English |
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2011
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| Online Access: | http://eprints.utem.edu.my/id/eprint/4708/ http://eprints.utem.edu.my/id/eprint/4708/1/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/4708/2/SJC_Invited.pdf |
| _version_ | 1848887059425525760 |
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| author | T. Joseph, Sahaya Anand |
| author_facet | T. Joseph, Sahaya Anand |
| author_sort | T. Joseph, Sahaya Anand |
| building | UTeM Institutional Repository |
| collection | Online Access |
| description | The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. |
| first_indexed | 2025-11-15T19:48:22Z |
| format | Conference or Workshop Item |
| id | utem-4708 |
| institution | Universiti Teknikal Malaysia Melaka |
| institution_category | Local University |
| language | English English |
| last_indexed | 2025-11-15T19:48:22Z |
| publishDate | 2011 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | utem-47082015-05-28T03:27:33Z http://eprints.utem.edu.my/id/eprint/4708/ TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films T. Joseph, Sahaya Anand TJ Mechanical engineering and machinery The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. 2011-01 Conference or Workshop Item PeerReviewed text/html en http://eprints.utem.edu.my/id/eprint/4708/1/SJC_Invited.pdf application/pdf en http://eprints.utem.edu.my/id/eprint/4708/2/SJC_Invited.pdf T. Joseph, Sahaya Anand (2011) TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. In: International Conference on Nanotechnology and Ultrasound, 12 - 14 January 2011, Tiruchirapalli, INDIA. |
| spellingShingle | TJ Mechanical engineering and machinery T. Joseph, Sahaya Anand TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title | TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title_full | TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title_fullStr | TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title_full_unstemmed | TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title_short | TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
| title_sort | tem studies of sputter-deposited ni4al alloy thin films |
| topic | TJ Mechanical engineering and machinery |
| url | http://eprints.utem.edu.my/id/eprint/4708/ http://eprints.utem.edu.my/id/eprint/4708/1/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/4708/2/SJC_Invited.pdf |