Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

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Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist

This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet...

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Bibliographic Details
Main Authors:	Koukharenko, Elena, Jekaterina , Kuleshova, Fowler, Marcel, Kok, Swee Leong, Tudor, Michael J., Beeby, Stephen P., Nandhakumar, Iris, White, Neil
Format:	Article
Published:	Jpn. J. Appl. Phys. 2010
Subjects:	TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://eprints.utem.edu.my/id/eprint/4371/

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