APA (7th ed.) Citation

Koukharenko, E., Jekaterina , K., Fowler, M., Kok, S. L., Tudor, M. J., Beeby, S. P., . . . White, N. (2010). Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist. Jpn. J. Appl. Phys.

Chicago Style (17th ed.) Citation

Koukharenko, Elena, Kuleshova Jekaterina , Marcel Fowler, Swee Leong Kok, Michael J. Tudor, Stephen P. Beeby, Iris Nandhakumar, and Neil White. Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl Methacrylate) 950 Photoresist. Jpn. J. Appl. Phys, 2010.

MLA (9th ed.) Citation

Koukharenko, Elena, et al. Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl Methacrylate) 950 Photoresist. Jpn. J. Appl. Phys, 2010.