APA (7th ed.) Citation

Fauziyah, S. (2011). Influence of HALO and Source/Drain Implantation on Threshold Voltage in 45nm PMOS Device. International Network for Scientific Information Publication (INSI).

Chicago Style (17th ed.) Citation

Fauziyah, Salehuddin. Influence of HALO and Source/Drain Implantation on Threshold Voltage in 45nm PMOS Device. International Network for Scientific Information Publication (INSI), 2011.

MLA (9th ed.) Citation

Fauziyah, Salehuddin. Influence of HALO and Source/Drain Implantation on Threshold Voltage in 45nm PMOS Device. International Network for Scientific Information Publication (INSI), 2011.

Warning: These citations may not always be 100% accurate.