APA (7th ed.) Citation

Fauziyah, S. (2009). Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness for 45nm NMOS Device. IJENS Publishers.

Chicago Style (17th ed.) Citation

Fauziyah, Salehuddin. Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness For 45nm NMOS Device. IJENS Publishers, 2009.

MLA (9th ed.) Citation

Fauziyah, Salehuddin. Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness For 45nm NMOS Device. IJENS Publishers, 2009.

Warning: These citations may not always be 100% accurate.