Optimization of Process Parameter Variability in 45 nm PMOS Device using Taguchi Method

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Optimization of Process Parameter Variability in 45 nm PMOS Device using Taguchi Method

This study reports on an investigation of the effect and optimization of process parameter variability on poly sheet resistance (RS) and leakage current (ILeak) in 45 nm PMOS device. The experimental studies were conducted under varying four process parameters, namely Halo implantation, Source/Drain...

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Bibliographic Details
Main Author:	Fauziyah, Salehuddin
Format:	Article
Language:	English
Published:	Asian Network for Scientific Information 2011
Subjects:	TA Engineering (General). Civil engineering (General)
Online Access:	http://eprints.utem.edu.my/id/eprint/3788/ http://eprints.utem.edu.my/id/eprint/3788/1/%28J3%29_JAP_11%287%29_1261-1266.pdf

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