APA (7th ed.) Citation

Fauziyah, S. (2010). Impact of SALICIDE and Source/Drain Implants on Leakage Current and Sheet Resistance in 45nm NMOS Device. Universiti Teknikal Malaysia Melaka.

Chicago Style (17th ed.) Citation

Fauziyah, Salehuddin. Impact of SALICIDE and Source/Drain Implants on Leakage Current and Sheet Resistance in 45nm NMOS Device. Universiti Teknikal Malaysia Melaka, 2010.

MLA (9th ed.) Citation

Fauziyah, Salehuddin. Impact of SALICIDE and Source/Drain Implants on Leakage Current and Sheet Resistance in 45nm NMOS Device. Universiti Teknikal Malaysia Melaka, 2010.

Warning: These citations may not always be 100% accurate.