Siow, Y. T. (2008). Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study [TR940. S618 2008 f rb].
Chicago Style (17th ed.) CitationSiow, Yuen Tien. Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study [TR940. S618 2008 F Rb]. 2008.
MLA (9th ed.) CitationSiow, Yuen Tien. Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study [TR940. S618 2008 F Rb]. 2008.
Warning: These citations may not always be 100% accurate.