Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].

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Compact Modeling Of Deep Submicron CMOS Transistor With Shallow Trench Isolation Mechanical Stress Effect [TK7871.99.M44 T161 2008 f rb].

Thesis ini memperkenalkan satu model padat, dua model berasaskan empirikal dan satu model berasaskan fizikal untuk kesan tekanan mekanikal Pengasingan Peparit Cetek (STI) ke atas transistor CMOS di bawah submikron. This thesis introduces a compact model, two empirical-based models and a physi...

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Bibliographic Details
Main Author:	Tan, Philip Beow Yew
Format:	Thesis
Language:	English
Published:	2008
Subjects:	TK7800-8360 Electronics
Online Access:	http://eprints.usm.my/9583/ http://eprints.usm.my/9583/1/COMPACT_MODELING_OF_DEEP_SUBMICRON_CMOS_TRANSISTOR.pdf

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