Ferroelectric Thin Film Materials Deposition By Physical Vapor Deposition

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Ferroelectric Thin Film Materials Deposition By Physical Vapor Deposition

Thin film is a layer of material that has the thickness that ranging from a few nanometers to a few micrometers and have been used in the fabrication of the MEMS devices. The properties of the thin films are affected by the type of the materials and one of the thin film materials is the ferroelec...

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Bibliographic Details
Main Author:	Chai, Tying Tying
Format:	Monograph
Language:	English
Published:	Universiti Sains Malaysia 2019
Subjects:	T Technology TJ Mechanical engineering and machinery
Online Access:	http://eprints.usm.my/58391/ http://eprints.usm.my/58391/1/Ferroelectric%20Thin%20Film%20Materials%20Deposition%20By%20Physical%20Vapor%20Deposition.pdf

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