Characterization And Behaviour Of Silicon Dioxide Nanoparticles In Chemical Mechanical Polishing Wastewater With The Presence Of Ferrous Sulphate And Polyaluminium Chloride

Characterization And Behaviour Of Silicon Dioxide Nanoparticles In Chemical Mechanical Polishing Wastewater With The Presence Of Ferrous Sulphate And Polyaluminium Chloride

In the twenty-first century, semiconductor industry is one of the most competitive manufacturing industries around worldwide. This is due to high demand of semiconductor for the manufacturing of electronic devices in this high technology era. While there are many wafers and chips produced daily from...

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Bibliographic Details
Main Author: Sin, Jing Yao
Format: Monograph
Language:English
Published: Universiti Sains Malaysia 2017
Subjects:
T Technology
TA Engineering (General). Civil engineering (General)
Online Access:http://eprints.usm.my/51952/
http://eprints.usm.my/51952/1/Characterization%20And%20Behaviour%20Of%20Silicon%20Dioxide%20Nanoparticles%20In%20Chemical%20Mechanical%20Polishing%20Wastewater%20With%20The%20Presence%20Of%20Ferrous%20Sulphate%20And%20Polyaluminium%20Chloride_Sin%20Jing%20Yao_A9_2017.pdf

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