Effect Of Annealing Temperature On Cerium Oxide Thin Films Grown By DC Sputtering Method

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Effect Of Annealing Temperature On Cerium Oxide Thin Films Grown By DC Sputtering Method

The cerium thin films were deposited on n-type Si (100) substrate by direct current (DC) sputtering followed by post-annealing at different temperature (400ᵒC and 600ᵒC, 800ᵒC, 1000ᵒC) in an oxygen ambient. In this study, the effect of annealing temperature on the crystallized CeO2 thin films was c...

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Bibliographic Details
Main Authors:	Ainita Rozati Mohd, Zabidi, Hassan, Zainuriah, Lim, Way Foong
Format:	Conference or Workshop Item
Language:	English
Published:	2020
Subjects:	QC1-999 Physics
Online Access:	http://eprints.usm.my/49082/ http://eprints.usm.my/49082/1/ABSTRACT%20BOOK%20MNRG%202020.pdf%20cut%2069.pdf

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