APA (7th ed.) Citation

Hamzah, N., Asri, R., Ahmad, M. A., Md Sahar, M. A. A. Z., Waheeda, S. N., & Hassan, Z. (2019). Effect Of Post-Annealing In Oxygen Environment On Ito Thin Films Deposited Using RF Magnetron Sputtering.

Chicago Style (17th ed.) Citation

Hamzah, N.A, R.I.M Asri, M. A. Ahmad, M. A. A. Z. Md Sahar, S. N. Waheeda, and Z. Hassan. Effect Of Post-Annealing In Oxygen Environment On Ito Thin Films Deposited Using RF Magnetron Sputtering. 2019.

MLA (9th ed.) Citation

Hamzah, N.A, et al. Effect Of Post-Annealing In Oxygen Environment On Ito Thin Films Deposited Using RF Magnetron Sputtering. 2019.