UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation

Transition metal oxides semiconductors are well known multifunction compounds, some show an n-type behaviour such as zinc oxide, titanium oxide and the others behave as p-type semiconductors. In this study nickel oxide (NiO) thin films (as a p-type semiconductor) was prepared via two-step process, f...

Full description

Bibliographic Details
Main Authors: Nomaan, Ahlaam T., Al-Hardan, Naif H., Ahmed, Naser M., Ng, Sha Shiong, Aziz, Azlan Abdul
Format: Conference or Workshop Item
Language:English
Published: 2019
Subjects:
Online Access:http://eprints.usm.my/48888/
http://eprints.usm.my/48888/1/ICoSeMT%202019%20ABSTRACT%20BOOK%2032.pdf
_version_ 1848881283697999872
author Nomaan, Ahlaam T.
Al-Hardan, Naif H.
Ahmed, Naser M.
Ng, Sha Shiong
Aziz, Azlan Abdul
author_facet Nomaan, Ahlaam T.
Al-Hardan, Naif H.
Ahmed, Naser M.
Ng, Sha Shiong
Aziz, Azlan Abdul
author_sort Nomaan, Ahlaam T.
building USM Institutional Repository
collection Online Access
description Transition metal oxides semiconductors are well known multifunction compounds, some show an n-type behaviour such as zinc oxide, titanium oxide and the others behave as p-type semiconductors. In this study nickel oxide (NiO) thin films (as a p-type semiconductor) was prepared via two-step process, first Ni metal is thermally evaporated on an n-type silicon substrate in high vacuum thermal evaporation unit, then thermal oxidation was employed to convert the Ni metal to NiO in a controllable tube furnace at atmospheric ambient. The prepared thin films were characterized through X-ray diffraction to verify its phase structures, ultraviolet–visible spectrophotometry to study its optical properties. The prepared p-n junction based on NiO thin films and the Si substrate was tested as UV-visible photodetector. The results show a blind sun light photodetector with high selectivity to UV light. The device performance as a UV photodetector will be explored.
first_indexed 2025-11-15T18:16:34Z
format Conference or Workshop Item
id usm-48888
institution Universiti Sains Malaysia
institution_category Local University
language English
last_indexed 2025-11-15T18:16:34Z
publishDate 2019
recordtype eprints
repository_type Digital Repository
spelling usm-488882021-04-14T03:45:55Z http://eprints.usm.my/48888/ UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation Nomaan, Ahlaam T. Al-Hardan, Naif H. Ahmed, Naser M. Ng, Sha Shiong Aziz, Azlan Abdul QC1-999 Physics Transition metal oxides semiconductors are well known multifunction compounds, some show an n-type behaviour such as zinc oxide, titanium oxide and the others behave as p-type semiconductors. In this study nickel oxide (NiO) thin films (as a p-type semiconductor) was prepared via two-step process, first Ni metal is thermally evaporated on an n-type silicon substrate in high vacuum thermal evaporation unit, then thermal oxidation was employed to convert the Ni metal to NiO in a controllable tube furnace at atmospheric ambient. The prepared thin films were characterized through X-ray diffraction to verify its phase structures, ultraviolet–visible spectrophotometry to study its optical properties. The prepared p-n junction based on NiO thin films and the Si substrate was tested as UV-visible photodetector. The results show a blind sun light photodetector with high selectivity to UV light. The device performance as a UV photodetector will be explored. 2019-04-30 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.usm.my/48888/1/ICoSeMT%202019%20ABSTRACT%20BOOK%2032.pdf Nomaan, Ahlaam T. and Al-Hardan, Naif H. and Ahmed, Naser M. and Ng, Sha Shiong and Aziz, Azlan Abdul (2019) UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation. In: International Conference On Semiconductor Materials Technology.
spellingShingle QC1-999 Physics
Nomaan, Ahlaam T.
Al-Hardan, Naif H.
Ahmed, Naser M.
Ng, Sha Shiong
Aziz, Azlan Abdul
UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title_full UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title_fullStr UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title_full_unstemmed UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title_short UV Photodetector Based On P-N Junction Of Nickel Oxide Thin Films And N-Type Silicon Prepared By Thermal Oxidation
title_sort uv photodetector based on p-n junction of nickel oxide thin films and n-type silicon prepared by thermal oxidation
topic QC1-999 Physics
url http://eprints.usm.my/48888/
http://eprints.usm.my/48888/1/ICoSeMT%202019%20ABSTRACT%20BOOK%2032.pdf