Effect Of Tetramethylammonium Hydroxide (TMAH) Etchant On The Formation Of Silicon Nanowires Transistor Patterned By Atomic Force Microscopy (AFM)
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Effect Of Tetramethylammonium Hydroxide (TMAH) Etchant On The Formation Of Silicon Nanowires Transistor Patterned By Atomic Force Microscopy (AFM) Lithography

In this research, AFM lithography was performed to create nanoscale oxide pattern of silicon nanowires transistor (SiNWT) structure via local anodic oxidation (LAO) process on silicon on insulator (SOI) surface. These nanoscale oxide patterns will act as a mask to protect silicon layer during etchin...

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Bibliographic Details
Main Author:	Lew, Kam Chung
Format:	Thesis
Language:	English
Published:	2011
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/43362/ http://eprints.usm.my/43362/1/LEW%20KAM%20CHUNG.pdf

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